Generic lithography modeling with dual-band optics-inspired neural networks

Haoyu Yang, Zongyi Li, Kumara Sastry, Saumyadip Mukhopadhyay, Mark Kilgard, Anima Anandkumar, Brucek Khailany, Vivek Sigh, Haoxing (Mark) Ren

September 2022

link

Type

Conference paper

Publication

ACM/IEEE Design Automation Conference